FLICE – Fluoritech

Maskless, fast and highly selective etching of fused silica with gaseous fluorine and gaseous hydrogen fluoride

Author(s): Francesco Venturini, Rebeca Martinez Vazquez, Roberto Osellame, Giulio Cerullo, Maurizio Sansotera and[…]

Advances in glass Microfabrication. Femtosecond laser irradiation followed by chemical etching.

Author(s): VENTURINI F., SANSOTERA M., OSELLAME R., CERULLO G., NAVARRINI W. Source: Chimica[…]

Micromanufacturing in Fused Silica via Femtosecond Laser Irradiation Followed by Gas-Phase Chemical Etching.

Author(s): VENTURINI F., SANSOTERA M., VAZQUEZ R. M., OSELLAME R., CERULLO G., NAVARRINI[…]

3rd Symposium on Continuous Flow Reactor Technology for Industrial Applications – October 2-4, 2011 – Como, Italy

Selective Iterative Etching of Fused Silica with Gaseous Hydrofluoric Acid.

Author(s): Venturini, Francesco; Navarrini, Walter; Resnati, Giuseppe; Metrangolo, Pierangelo; Vazquez, Rebeca Martinez;[…]

19th International Symposium on Fluorine Chemistry – Jackson Hole (USA) – August 23-28, 2009

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Selective Etching of Fused Silica with Low Pressure Gaseous Hydrofluoridric Acid

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